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Three-step pulse electrochemical deposition of FeSxOy thin films and their characterization

Supee, A. and Ichimura, M. (2017) Three-step pulse electrochemical deposition of FeSxOy thin films and their characterization. Materials Research Express, 4 (3). ISSN 2053-1591

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Abstract

Three-step pulse electrochemical deposition was used to deposit FeSxOy thin films on indium-tinoxide-coated glass substrates at room temperature from solution containing Na2S2O3 and FeSO4. The deposition was conducted under two different potential shifts direction (condition A: from negative to positive and condition B: from positive to negative) with intermediate potential V2 variation. All the deposited films were amorphous. In Raman measurements, peaks attributed to marcasite and Fe1+xS were observed. The O/Fe ratio is larger than unity. The films deposited under condition A with an intermediate potential V2 = 0.6 V and condition B with V2 = 0.4 V showed a band gap which is estimated around 2.3-2.45 eV, larger than literature value of Fe2O3 (2.1 eV). In the photoelectrochemical measurement, nearly intrinsic behavior was confirmed.

Item Type:Article
Uncontrolled Keywords:Iron oxide, Iron sulphide
Subjects:T Technology > TP Chemical technology
Divisions:Chemical Engineering
ID Code:76929
Deposited By: Fazli Masari
Deposited On:30 Apr 2018 22:26
Last Modified:30 Apr 2018 22:26

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