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Synthesis of Ge nanostructures on Si substrate by a convenient electrochemical technique at room temperature for different durations

Jawad, M. J. and Hashim, M. R. and Ali, Nihad Kalaf (2014) Synthesis of Ge nanostructures on Si substrate by a convenient electrochemical technique at room temperature for different durations. Superlattices and Microstructures, 69 . pp. 129-135. ISSN 1096-3677

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Official URL: http://dx.doi.org/10.1016/j.spmi.2014.01.022

Abstract

The electrochemical deposition technique at room temperature was used to study the synthesis of Ge like-cubic nanorods grown on n-type Si (100) wafer. The effect of deposition time on the morphological, structural and optical properties of nanostructures was investigated. Different Ge morphologies of as-grown on Si were shown by FESEM images. The shape and the dimensions of the structures showed dependence on the deposition time and the film thickness increases with increasing the deposition time. The lattice constants, crystallite size of c-Ge crystal and the strains were calculated. The Raman spectra exhibited slightly downward sift and broader band width in comparison with the bulk-Ge.

Item Type:Article
Uncontrolled Keywords:duration of deposition, electrochemical deposition
Subjects:T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions:Electrical Engineering
ID Code:62789
Deposited By: Fazli Masari
Deposited On:15 Jun 2017 00:56
Last Modified:15 Jun 2017 00:56

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