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Gas Phase Diagnostics during Silicon Carbide Films Deposition Using Very High Frequency - Plasma Enhanced Chemical Vapor Deposition

Mustapha, N. and Omar, M. F. and Ismail, A. K. and Zainal, J. and Raja Ibrahim, R. K. (2015) Gas Phase Diagnostics during Silicon Carbide Films Deposition Using Very High Frequency - Plasma Enhanced Chemical Vapor Deposition. NATIONAL PHYSICS CONFERENCE 2014 (PERFIK 2014), 1657 . ISSN 0094-243X

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Item Type:Article
Subjects:A General Works
ID Code:59286
Deposited By: Haliza Zainal
Deposited On:18 Jan 2017 09:50
Last Modified:19 Jan 2017 09:24

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