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Preliminary study of CDTE and CDTE:CU thin films nanostructures deposited by using DC magnetron sputtering

Marwoto, P. and Made, D. P. N. and Sugianto, Sugianto and Wibowo, E. and Othaman, Z. and Astuti, S. Y. and Aryani, N. P. (2013) Preliminary study of CDTE and CDTE:CU thin films nanostructures deposited by using DC magnetron sputtering. In: AIP Conference Proceedings.

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Official URL: http://dx.doi.org/10.1063/1.4820991

Abstract

Growth and properties of CdTe and CdTe:Cu thin films nanostrucures deposited by using dc magnetron sputtering are reported. Scanning electron microscope (SEM) was used to observe the surface morphologies of the thin films. At growth conditions of 250 °C and 14 W, CdTe films did not yet evenly deposited. However, at growth temperature and plasma power of 325 °C and 43 W, both CdTe and CdTe:Cu(2%) have deposited on the substrates. In this condition, the morphology of the films indicate that the films have a grain-like nanostructures. Grain size diameter of about 200 nm begin to appear on top of the films. Energy Dispersive X-rays spectroscopy (EDX) was used to investigate chemical elements of the Cu doped CdTe film deposited. It was found that the film deposited consist of Cd, Te and Cu elements. XRD was used to investigate the full width at half maximum (FWHM) values of the thin films deposited. The results show that CdTe:Cu(2%) thin film has better crystallographic properties than CdTe thin film. The UV-Vis spectrometer was used to investigate the optical properties of thin films deposited. The transmittance spectra showed that transmittance of CdTe:Cu(2%) film is lower than CdTe film. It was found that the bandgap energy of CdTe and CdTe:Cu(2%) thin films of about 1.48 eV.

Item Type:Conference or Workshop Item (Paper)
Uncontrolled Keywords:thin films
Subjects:Q Science
Divisions:Science
ID Code:51255
Deposited By: Haliza Zainal
Deposited On:27 Jan 2016 09:53
Last Modified:18 Sep 2017 08:34

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