Fabrication of nanowire using ash trimming technique

Abstract

The paper present a report on fabrication of Nanowire using plasma oxidation, we monitor changes by studying the morphology and Δw / Δh, the study also revealed that the proposed fabrication method could potentially be used to fabricate specific nanometer-scale structure and space structure with uniform surface morphology without any damage to the photoresist. Yet with reduced ashing time and without popping of the photoresist ashing process when the a fabricated is being carried out and subsequently trimmed to nanosize by plasma oxidation, the study also revealed the dramatic increase in aspect ratio as the structure reduces in lateral dimension.