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Formation and characterization of silicon self-assembled nanodots

Idrees, F. A. and Sakrani, Samsudi and Othaman, Zulkafli (2011) Formation and characterization of silicon self-assembled nanodots. In: Enabling Science And Nanotechnology. American Institute of Physics, USA, pp. 324-327. ISBN 978-073540897-5

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Official URL: http://dx.doi.org/10.1063/1.3587011


Silicon self-assembled quantum dots have been successfully prepared on corning glass (7059) substrate. The samples were fabricated using the common technique RF magnetron sputtering system depend on plasma excitation at varying growth parameters and high temperature of more than 500°C. The measurements of average dots size estimated to be 36 nm is confirmed by using AFM. The PL peak located at 570 nm, informed band gap energy=2.10eV larger than bulk material band gap, that confirmed the miniaturized of the dots. To measure the Silicon atomic% deposit on corning glass (7059) substrate EDX has been used.

Item Type:Book Section
Uncontrolled Keywords:corning glass (7059), quantum dot, RF magnetron sputtering, self-assembled growth
Subjects:Q Science
ID Code:29714
Deposited By: Liza Porijo
Deposited On:22 Mar 2013 16:30
Last Modified:04 Feb 2017 15:40

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