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Characterization analysis of nano scale vertical double gate MOSFET (VDGM) using TCAD

Ismail, Razali and Saad, Ismail (2007) Characterization analysis of nano scale vertical double gate MOSFET (VDGM) using TCAD. In: 4th International Conference on Materials for Advanced Technologies (ICMAT 2007), 1st – 6th July 2007, Singapore.

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Abstract

We experimentally demonstrate and characterize a vertical (current flow that is perpendicular to the wafer) source (bottom)/drain (top) double-gate capacitorless single-transistor DRAM on a bulk silicon wafer.

Item Type:Conference or Workshop Item (Paper)
Subjects:T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions:Electrical Engineering
ID Code:24427
Deposited By:INVALID USER
Deposited On:18 Apr 2012 05:41
Last Modified:03 Aug 2017 00:33

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