Karim, N. A. and Ludin, N. A. and Mat-Teridi, M. A. and Sepeai, S. and Ibrahim, M. A. and Kouhnavard, M. and Sopian, K. and Arakawa, H. (2018) Effects of deposition time on of cobalt sulfide thin film electrode formation. Malaysian Journal of Analytical Sciences, 22 (1). pp. 80-86. ISSN 1394-2506
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Official URL: http://dx.doi.org/10.17576/mjas-2018-2201-10
Abstract
Cobalt sulfide counter electrodes (CE) were prepared using the electrodeposition and ionic exchange deposition method on the fluorine doped tin oxide (FTO). Time deposition effect of thin film were analyzed by using a field emission scanning X-ray diffraction (XRD), field emission electron microscope (FESEM), atomic force microscopic (AFM), and profilometry. The electrocatalytic activities of electrode were measured using cyclic voltammetry (CV) analysis. The growth of cobalt sulfide structure was confirmed by XRD. Therefore, the optimum deposition time of cobalt sulfide thin film electrode at 10 min was exhibiting the higher electrocatalytic activity with cathodic current and surface roughness of -3.36 mA.cm-2 and 34 nm, respectively.
| Item Type: | Article |
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| Uncontrolled Keywords: | Cobalt sulfide, Electrocatalytic activity, Electrodeposition, Ion exchange deposition, Surface roughness |
| Subjects: | T Technology > T Technology (General) |
| Divisions: | Malaysia-Japan International Institute of Technology |
| ID Code: | 79810 |
| Deposited By: | Narimah Nawil |
| Deposited On: | 28 Jan 2019 06:56 |
| Last Modified: | 28 Jan 2019 06:56 |
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