Universiti Teknologi Malaysia Institutional Repository

A study of 3-D Zinc Oxide nanowire field effect transistor with defect and interface charge density

Khoo, W. H. and Sultan, S. M. (2016) A study of 3-D Zinc Oxide nanowire field effect transistor with defect and interface charge density. In: IEEE Student Conference on Research and Development, SCOReD 2015, 13 - 14 Dec 2015, Kuala Lumpur, Malaysia.

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Abstract

Electrical characteristics of three-dimensional Zinc Oxide nanowire field effect transistor has been studied using 3-D TCAD tool. The device exhibited a good output performance that clearly shows linear and saturation mode with threshold voltage of 0.75V, field-effect mobility of ∼108 cm2/v.s and on/off current ratio of ∼109. This device is then introduced with defect and interface charge density separately, which results on reduction of the field-effect mobility and an increase of the threshold voltage. This study is useful to determine possible factors causing poor performance of fabricated device and also can work as gas sensor device by putting trap or change the surface charge density.

Item Type:Conference or Workshop Item (Paper)
Uncontrolled Keywords:Defect, Interface Charge Density, ZnO NWFET
Subjects:T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions:Electrical Engineering
ID Code:73328
Deposited By: Mohd Zulaihi Zainudin
Deposited On:20 Nov 2017 08:42
Last Modified:20 Nov 2017 08:42

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