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Macrodroplet reduction and growth mechanisms in cathodic arc physical vapor deposition of TiN films

Ali, M. and Hamzah, E. and Abbas, T. and Mohd Toff, M.R.H. and Qazi, I.A. (2008) Macrodroplet reduction and growth mechanisms in cathodic arc physical vapor deposition of TiN films. Surface Review and Letters , 15 (5). pp. 653-659. ISSN 0218625X

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Official URL: http://ejournals.worldscientific.com.sg

Abstract

Cathodic arc physical vapor deposition (CAPVD) a technique used for the deposition of hard coatings for tooling applications has many advantages. The main drawback of this technique is the formation of macrodroplets (MDs) during deposition resulting in films with rougher morphology. The MDs contamination and growth mechanisms was investigated in TiN coatings over high-speed steel, as a function of metal ion etching, substrate bias, and nitrogen gas flow rate; it was observed that the latter is the most important factor in controlling the size and number of the macrodroplets. © 2008 World Scientific Publishing Company.

Item Type:Article
Uncontrolled Keywords:Cathodic arc; Macrodroplets; Morphology; PVD; Surface roughness; TiN
Subjects:T Technology > TJ Mechanical engineering and machinery
Divisions:Mechanical Engineering
ID Code:7021
Deposited By: Dr Abd Rahim Abu Bakar
Deposited On:15 Dec 2008 08:14
Last Modified:15 Dec 2008 08:14

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