Morphological study of RF magnetron sputtered silicon thin films on aisi 304 stainless steel

Abstract

Silicon thin films on AISI 304 stainless steel were deposited using RF magnetron sputtering. The effect of substrate temperature on the film properties were investigated as the films were prepared at different substrate temperature. Solid phase reaction between Si and Fe from the substrate has led to the formation of single crystal hexagonal shape Fe2Si layer on the surface of 304 stainless steel (cubic crystal). Film morphology characterized by field emission scanning electron microscope (FE-SEM) and atomic force microscope (AFM) showed the films acquired zone T microstructure and surface roughness was increased with temperature. The film adhesion strength was determined according to VDI 3198 standard for Rockwell-C indentation test. Results from indentation showed good films adhesion was formed and no extended delamination of the films was observed.