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Process and characterization of 50 nm vertical double gate MOSFET (VDGM) with filox using TCAD tools

Ismail, Razali and Saad, Ismail (2006) Process and characterization of 50 nm vertical double gate MOSFET (VDGM) with filox using TCAD tools. In: National Physics Conference (PERFIK 2006), 2006, Kuala Lumpur.

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Item Type:Conference or Workshop Item (Paper)
Subjects:T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions:Electrical Engineering
ID Code:25319
Deposited By: Liza Porijo
Deposited On:17 May 2012 04:13
Last Modified:17 May 2012 04:13

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