Universiti Teknologi Malaysia Institutional Repository

Process and characterization of 50 nm vertical double gate MOSFET (VDGM) with filox using TCAD tools

Ismail, Razali and Saad, Ismail (2006) Process and characterization of 50 nm vertical double gate MOSFET (VDGM) with filox using TCAD tools. In: National Physics Conference (PERFIK 2006), 2006, Kuala Lumpur.

Full text not available from this repository.


Item Type:Conference or Workshop Item (Paper)
Uncontrolled Keywords:kiv record
Subjects:T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions:Electrical Engineering
ID Code:25319
Deposited By: Mrs Liza Porijo
Deposited On:17 May 2012 04:13
Last Modified:11 Oct 2017 07:50

Repository Staff Only: item control page