Universiti Teknologi Malaysia Institutional Repository

Carbon thin films deposition by krf pulsed laser at different temperatures

Qindeel, Rabia (2010) Carbon thin films deposition by krf pulsed laser at different temperatures. In: Nanotech Malaysia 2010, International Conference on Enabling Science & Technology , 1-3 December 2010, Kuala Lumpur, Malaysia.

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Official URL: http://dx.doi.org/10.1109/ESCINANO.2010.5700932

Abstract

In this paper, carbon thin films were prepared by KrF pulsed laser deposition at 20 °C and 300 °C. The surface morphology were characterized by atomic force microscopy (AFM). The nature of bonding of carbon thin films deposited at different temperatures has been done by using technique Fourier infrared transformation spectroscopy (FTIR).

Item Type:Conference or Workshop Item (Paper)
Uncontrolled Keywords:AFM, FTIR
Subjects:Q Science
Divisions:Science
ID Code:23859
Deposited By: Liza Porijo
Deposited On:18 Sep 2012 05:48
Last Modified:18 Sep 2012 05:48

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