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Analysis of pillar thickness variation on source-on-top (SOT) nanoscale vertical MOSFET with oblique rotating implantation (ORI) method

A. Riyadi, Munawar and Saad, Ismail and Ahmadi Razali Ismail, Mohammad Taghi (2008) Analysis of pillar thickness variation on source-on-top (SOT) nanoscale vertical MOSFET with oblique rotating implantation (ORI) method. In: MASS Regional Conference on Solid State Science and Technology (RCSSST 2008), 2008, Port Dickson.

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Item Type:Conference or Workshop Item (Paper)
Subjects:T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions:Electrical Engineering
ID Code:16873
Deposited By: Liza Porijo
Deposited On:31 Oct 2011 07:34
Last Modified:31 Oct 2011 07:34

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