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Influence of temperature and pressure on growth of silicon nanowires by plasma enhanced chemical vapor deposition

Hamidinezhad, Habib and Wahab, Yussof and Othaman, Zulkafli and Sumpono, Imam (2009) Influence of temperature and pressure on growth of silicon nanowires by plasma enhanced chemical vapor deposition. In: RegionalConference on Solid State Science and Technology (RCSSCT 2009), 2009, Bayview Resort, Penang.

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Item Type:Conference or Workshop Item (Paper)
Uncontrolled Keywords:kiv record
Subjects:Q Science > Q Science (General)
Divisions:Science
ID Code:15320
Deposited By: Mrs Liza Porijo
Deposited On:26 Sep 2011 04:44
Last Modified:11 Oct 2017 04:19

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