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Influence of temperature and pressure on growth of silicon nanowires by plasma enhanced chemical vapor deposition

Hamidinezhad, Habib and Wahab, Yussof and Othaman, Zulkafli and Sumpono, Imam (2009) Influence of temperature and pressure on growth of silicon nanowires by plasma enhanced chemical vapor deposition. In: RegionalConference on Solid State Science and Technology (RCSSCT 2009), 2009, Bayview Resort, Penang.

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Item Type:Conference or Workshop Item (Paper)
Subjects:Q Science > Q Science (General)
Divisions:Science
ID Code:15320
Deposited By: Liza Porijo
Deposited On:26 Sep 2011 04:44
Last Modified:26 Sep 2011 04:44

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